David M Evans

Title: Innovations of David M Evans

Introduction

David M Evans is an accomplished inventor based in Braddon, Australia. He has made significant contributions to the field of defect detection in digitized device images. With a total of 2 patents, his work showcases a blend of innovative techniques that enhance the accuracy and efficiency of image inspection.

Latest Patents

One of David's latest patents is an inspection method and apparatus designed for the inspection of either random or array devices. This invention employs a hybrid technique that combines spatial domain and frequency domain methods to identify defects in digitized images. By utilizing Fourier-like transforms, the two-dimensional spectra of two images are analyzed. Strong harmonics in the spectra are filtered out, allowing for precise alignment and subtraction of the images. The resulting spectrally-filtered difference image is then thresholded and analyzed for defects. This hybrid technique not only provides high performance but also offers flexibility in defect detection, addressing challenges such as shading variations and the dark-bright problem that other methods struggle to resolve.

Career Highlights

David M Evans is currently associated with Kla Instruments Corporation, where he continues to innovate in the field of image inspection. His work has positioned him as a key figure in developing advanced techniques for defect detection.

Collaborations

David has collaborated with notable colleagues, including Bin-Ming Ben Tsai and Jason Z Lin, contributing to a dynamic and innovative work environment.

Conclusion

David M Evans is a prominent inventor whose contributions to defect detection technology have made a significant impact in the field. His innovative approaches and collaborations continue to drive advancements in image inspection systems.