David M Alway

Title: David M Alway – Innovator in Marking Technology

Introduction

David M Alway, an inventive mind based in Windsor, California, has made significant strides in the field of marking technology. With a focus on enhancing methods for marking parts, his innovative ideas contribute to the practical applications of industry standards.

Latest Patents

David is the holder of a unique patent titled "Method and apparatus for marking parts." This patent details an advanced mechanism where a spray of ink, paint, or other marking liquids is deployed through a stencil member to create stencil characters on a part. The system includes various features to periodically move the stencil member, ensuring the cleanliness of the operation by removing the marking fluid. In one embodiment of the system, the stencil can rotate, employing centrifugal force to clear marking fluid efficiently. This mechanism also allows for additional removal methods such as suction and solvent action, making it versatile for different contexts.

Career Highlights

David M Alway plays a pivotal role at Diffracto, Ltd., where he further develops his innovative techniques and applies them in industrial applications. His career is marked by a commitment to improving marking technologies, making processes faster and more efficient for manufacturers.

Collaborations

At Diffracto, Ltd., David collaborates closely with talented coworkers, including Timothy R Pryor and Omer L Hageniers. Together, they foster an inventive environment that encourages creative solutions aimed at solving industry challenges.

Conclusion

David M Alway’s inventive contributions to marking technology underscore the impact of innovation in manufacturing processes. His patent not only highlights his ingenuity but also reflects the collaborative spirit in the field of engineering. As he continues to develop new technologies, David stands as a notable figure in the landscape of modern invention.