Holland, MI, United States of America

David Lucey

This inventor holds 1 USPTO granted patent. Top assignee: Jwi Ltd.. Active years: 1998.

IDiyas Innovation Intelligence. (2026). Inventor Profile: David Lucey. Retrieved from https://idiyas.com/inventor/david-lucey-vd4531yb

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 1998

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1 patent (USPTO):Explore Patents

Title: David Lucey - Innovator in Filter Press Technology

Introduction

David Lucey is an accomplished inventor based in Holland, MI (US). He has made significant contributions to the field of filter press technology. His innovative approach has led to the development of a unique mechanism that enhances the functionality of filter presses.

Latest Patents

David Lucey holds 1 patent for his invention titled "Drip tray lock mechanism for filter press." This patent describes a filter press equipped with an activating mechanism that securely holds the drip trays in a closed position before the stack of filter plates. The mechanism utilizes a fluid pressure cylinder to move the drip trays between open and closed positions. Additionally, it features a linkage that automatically locks the trays in place when they are closed, ensuring they remain secure even when the pressure to the activating cylinder is relieved.

Career Highlights

David Lucey is associated with JWI Ltd., where he applies his expertise in engineering and innovation. His work at the company has allowed him to focus on developing advanced solutions for industrial applications, particularly in the area of filtration technology.

Conclusion

David Lucey is a notable inventor whose work in filter press technology has made a significant impact. His innovative drip tray lock mechanism exemplifies his commitment to enhancing industrial processes.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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