David Lewis Fairhurst

Title: David Lewis Fairhurst: Innovator in Photoinitiator Technology

Introduction

David Lewis Fairhurst is a notable inventor based in Monroe, Connecticut. He has made significant contributions to the field of photoinitiator technology, particularly through his innovative patent. His work focuses on enhancing the sensitivity of film bases, which has important applications in various industries.

Latest Patents

Fairhurst holds a patent for a process titled "Diacetylene film sensitized with photoinitiator and applications of the film." This patent describes a method for improving the sensitivity of a film base that is coated with a dispersion of a normally crystalline polyacetylenic compound in a non-solvating liquid. The process involves drying the compound on the film surface to enhance its sensitivity to specific photon energy bands, particularly long wavelength UV. The polyacetylenic compound used in this process contains at least two conjugated acetylenic linkages and ranges from 12 to 60 carbon atoms. The sensitization to long wavelength UV is achieved through the addition of photoinitiators that absorb UV energy and convert it into free radicals.

Career Highlights

Fairhurst is associated with Isp Investments Inc., where he continues to develop and refine his innovative technologies. His work has led to advancements in the field of photoinitiators, which are crucial for various applications in the industry.

Collaborations

Fairhurst has collaborated with notable colleagues, including Xiang Y Yu and Hsiao-Yi Shih. These collaborations have contributed to the development of his patented technologies and have fostered innovation in the field.

Conclusion

David Lewis Fairhurst is a distinguished inventor whose work in photoinitiator technology has made a significant impact. His patent for diacetylene film sensitization showcases his innovative approach to enhancing film sensitivity. His contributions continue to influence the industry and pave the way for future advancements.