This inventor holds 1 USPTO granted patent. Top assignee: Delaware Capital Formation, Inc.. Active years: 1998.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 1998
Title: David Lee Truman: Innovator in Backwash Filter Systems
Introduction
David Lee Truman is an accomplished inventor based in Portage, MI (US). He is known for his innovative contributions to filtration technology, particularly in the development of backwash filter systems. His work has significantly impacted the efficiency and effectiveness of liquid filtration processes.
Latest Patents
David Lee Truman holds a patent for a backwash filter system. This system includes a filter array comprising a plurality of filter units, each featuring a housing, a filter element unit, a process liquid inlet port, and a filtered liquid outlet port. The design allows for efficient filtering of process liquid, with a process liquid inlet header connecting to the inlet ports and a filtered liquid outlet header connecting to the outlet ports. A first valve unit on the process liquid inlet header is switchable, enabling connection to either a process liquid source or a backwash liquid drain. The filtered liquid outlet header can communicate with a filtered liquid receiver, enhancing the system's functionality.
Career Highlights
David is associated with Delaware Capital Formation, Inc., where he continues to innovate and develop new technologies. His work in the field of filtration has garnered attention for its practical applications and effectiveness in various industries.
Collaborations
Throughout his career, David has collaborated with notable colleagues, including Kenneth Thomas Bennick and Michael Edward Isch. These partnerships have contributed to the advancement of his projects and the successful implementation of his inventions.
Conclusion
David Lee Truman is a notable inventor whose work in backwash filter systems exemplifies innovation in filtration technology. His contributions continue to influence the industry and improve liquid filtration processes.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile