US

David Lee Cyphert

This inventor holds 0 USPTO granted patents, plus 2 CIPO patents.

IDiyas Innovation Intelligence. (2026). Inventor Profile: David Lee Cyphert. Retrieved from https://idiyas.com/inventor/david-lee-cyphert-7tjeqba9

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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Title: David Lee Cyphert: Innovator in Marking Technology

Introduction

David Lee Cyphert is an inventive mind based in the United States, known for his contributions to marking technology. He has developed innovative apparatuses that enhance the quality and efficiency of forming multi-character messages on solid materials. Although he currently holds no patents, his work demonstrates a significant understanding of mechanical and pneumatic systems.

Latest Patents

Cyphert's latest inventions include the "Marking Apparatus With Multiple Line Capability" and the "Marking Apparatus With Matrix Defining Locus Of Movement." The first apparatus allows for the simultaneous formation of multi-character messages using an array of marker pins, which are moved by a carriage along a defined plane. This design incorporates a retrace feature for improved character quality. The second apparatus employs a similar concept but focuses on an undulating locus of movement to create pixel-defined characters through discrete indentations.

Career Highlights

David Lee Cyphert is associated with Telesis Controls Corporation, where he has applied his innovative ideas to develop advanced marking solutions. His work reflects a deep commitment to enhancing the capabilities of marking technologies.

Collaborations

Cyphert collaborates with his coworker, Thomas Edward Cyphert, contributing to the development of their innovative projects.

Conclusion

David Lee Cyphert's inventive contributions to marking technology showcase his expertise and dedication to innovation. His work continues to influence the field, paving the way for future advancements in marking apparatuses.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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