Somerville, MA, United States of America

David Lawrence

This inventor holds 1 USPTO granted patent. Top assignee: Massachusetts Institute of Technology. Active years: 2022.

IDiyas Innovation Intelligence. (2026). Inventor Profile: David Lawrence. Retrieved from https://idiyas.com/inventor/david-lawrence-exqg4mka

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 5(Granted Patents)


Company Filing History:


Years Active: 2022

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1 patent (USPTO):Explore Patents

Title: David Lawrence - Innovator in Non-Intrusive Monitoring

Introduction

David Lawrence is an accomplished inventor based in Somerville, MA (US). He has made significant contributions to the field of non-intrusive monitoring through his innovative patent. His work focuses on methods and apparatus for sensing physical parameters, such as electric and/or magnetic fields, which can be applied in various industries.

Latest Patents

David Lawrence holds a patent for "Non-intrusive monitoring - Methods and apparatus for non-intrusive monitoring by sensing physical parameters such as electric and/or magnetic fields." This technology has the potential to monitor electricity consumption and can be utilized in a variety of applications.

Career Highlights

David Lawrence is affiliated with the Massachusetts Institute of Technology, where he continues to advance his research and development in innovative technologies. His work has garnered attention for its practical applications and contributions to the field.

Collaborations

Some of his notable coworkers include John Sebastian Donnal and James Paris, who have collaborated with him on various projects.

Conclusion

David Lawrence is a notable inventor whose work in non-intrusive monitoring showcases the potential of innovative technologies to improve efficiency in monitoring systems. His contributions to the field are significant and continue to inspire future advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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