This inventor holds 2 USPTO granted patents. Top assignee: Hewlett-Packard Development Company, L.p.. Active years: 2004.
Company Filing History:
Years Active: 2004
Title: David L Neiman: Innovator in Emission Devices and Nano-Columnar Structures
Introduction
David L Neiman is a notable inventor based in Corvallis, OR (US). He has made significant contributions to the field of emission devices and materials science, holding a total of 2 patents. His work focuses on innovative technologies that enhance electron emission and the formation of advanced materials.
Latest Patents
Neiman's latest patents include an emission device and method for forming. This emission device features a plurality of electron emitter structures of varied geometry, each with a conducting layer that has openings at tunneling sites. These tunneling sites facilitate electron emissions from the varied geometry structures when voltage is applied. Another significant patent involves co-deposited films with nano-columnar structures. This invention describes a film formed on a substrate, which includes a nano-columnar structure of a first material along with a co-deposited second material.
Career Highlights
David L Neiman is currently associated with Hewlett-Packard Development Company, L.P. His work at this esteemed organization has allowed him to explore and develop cutting-edge technologies in his field. His innovative approach has led to advancements that are crucial for the development of new electronic devices.
Collaborations
Neiman has collaborated with notable colleagues such as Peter Mardilovich and Alexander N Govyadinov. These collaborations have fostered a creative environment that encourages the exchange of ideas and the development of groundbreaking technologies.
Conclusion
David L Neiman's contributions to the fields of emission devices and nano-columnar structures highlight his role as an influential inventor. His patents reflect a commitment to innovation and technological advancement.