David L Li

Title: David L Li: Innovator in Pattern Recognition Systems

Introduction

David L Li is a notable inventor based in Owego, NY (US). He has made significant contributions to the field of pattern recognition through his innovative methods and computer programs. His work focuses on enhancing the capabilities of pattern recognition systems by incorporating multi-modal structures.

Latest Patents

David L Li holds a patent titled "Method and computer program product for identifying output classes with multi-modal dispersion in feature space and incorporating multi-modal structure into a pattern recognition system." This patent describes a method and computer program product designed to identify output classes with multi-modal dispersion in feature space. The invention involves rejecting a plurality of input patterns that are not associated with any represented output class by a pattern recognition classifier. The rejected patterns are then grouped into clusters based on their similarities. Clusters containing samples associated with a represented output class are identified through independent review. The classifier is retrained to recognize these clusters as output pseudoclasses, which are then reorganized within the system architecture.

Career Highlights

David L Li is currently employed at Lockheed Martin Corporation, where he applies his expertise in pattern recognition and computer programming. His innovative approach has contributed to advancements in the field, making him a valuable asset to his organization.

Collaborations

Some of David's coworkers include Elliott D Reitz, Ii and Dennis A Tillotson. Their collaborative efforts in the field of pattern recognition have further enhanced the development of innovative solutions.

Conclusion

David L Li's contributions to pattern recognition systems exemplify the impact of innovation in technology. His patent and work at Lockheed Martin Corporation highlight his role as a leading inventor in this field.