This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Applied Materials, Inc.. Active years: 2018.
Company Filing History:
Years Active: 2018
Title: David Knick: Innovator in Plasma Processing Technology
Introduction
David Knick is a notable inventor based in Sunnyvale, CA, who has made significant contributions to the field of plasma processing technology. He holds a patent that showcases his innovative approach to improving the efficiency of plasma etching processes.
Latest Patents
David Knick is credited with a patent titled "Methods for in-situ chamber clean in plasma etching processing chamber." This patent outlines methods for in-situ chamber cleaning of a plasma processing chamber utilized in photomask plasma fabrication processes. The method involves supplying a cleaning gas mixture that includes at least an oxygen-containing gas and a hydrogen-containing gas into the plasma processing chamber. It also details controlling the processing pressure to less than 2 millitorr and applying RF source power to form plasma from the cleaning gas mixture, thereby effectively cleaning the processing chamber in the presence of the plasma. He holds 1 patent.
Career Highlights
David Knick is associated with Applied Materials, Inc., a leading company in the semiconductor and display technology sectors. His work at Applied Materials has positioned him as a key player in advancing plasma processing techniques.
Collaborations
Some of his notable coworkers include Banqiu Wu and Xiaoyi Chen, with whom he has collaborated on various projects within the realm of plasma technology.
Conclusion
David Knick's innovative contributions to plasma processing technology, particularly through his patented methods, highlight his role as a significant inventor in the field. His work continues to influence advancements in semiconductor manufacturing processes.