David Kern

Title: David Kern - Innovator in Dielectric Etching Technology

Introduction

David Kern is a notable inventor based in Lehighton, PA (US). He has made significant contributions to the field of dielectric etching, particularly in the development of etchants that enhance the fabrication of microelectromechanical systems and integrated circuits. His innovative approach has garnered attention in the industry.

Latest Patents

David Kern holds 1 patent for his invention related to dielectric etching. His patent describes an etchant for dielectrics, such as silicon dioxide, which effectively leaves the monocrystalline silicon surface exposed by the etchant free of etch damage, such as etch pits. This is achieved when the etch is conducted in the presence of transition metals, including copper, tungsten, titanium, and gold. The etchant comprises hydrofluoric acid and a source of halide anion, such as hydrochloric acid or a metal-halide. This invention is particularly useful in the fabrication of microelectromechanical systems and in deprocessing integrated circuits.

Career Highlights

David Kern is associated with LSI Corporation, where he applies his expertise in dielectric etching technology. His work has contributed to advancements in the field, making significant impacts on device fabrication processes.

Collaborations

David has collaborated with notable colleagues, including John Michael DeLucca and Frank Alexander Baiocchi. Their combined efforts have fostered innovation and development within their projects.

Conclusion

David Kern's contributions to dielectric etching technology exemplify the importance of innovation in the field of microelectronics. His patent and work at LSI Corporation highlight his role as a key inventor in advancing technology.