Company Filing History:
Years Active: 1998
Title: David John Pinckney: Innovator in Electron Beam Lithography
Introduction
David John Pinckney is a notable inventor based in Danbury, CT (US). He has made significant contributions to the field of electron beam lithography, holding 2 patents that showcase his innovative approach to technology.
Latest Patents
One of his latest patents is the "Low Profile Substrate Ground Probe." This invention is a simplified, low profile, adjustable substrate ground probe used in electron beam photolithography processing. The design is compatible with state-of-the-art electron beam lithographic processing tools that require minimal clearance. The ground contact base incorporates a flexure, an adjustable ground contact base, and an adjustment screw, allowing for precise height adjustments relative to the workpiece surface without the need for shims. The flexure is crafted as a one-piece probe body with a flame sprayed tungsten carbide ground contact surface.
Another significant patent is the "Heater for Membrane Mask in an Electron-Beam Lithography System." This method aims to reduce contamination in a silicon membrane mask within a lithography system. The process involves doping the top surface of the silicon membrane mask with boron to lower its electrical resistance, followed by metalizing the surface to further enhance conductivity. A voltage is then applied between opposite surfaces of the mask, generating an electric field that heats the membrane mask. The method also includes calculating distortions in the shape of patterns within the mask caused by heating and compensating for the proximity of other shapes.
Career Highlights
David John Pinckney is currently employed at International Business Machines Corporation (IBM), where he continues to innovate in the field of lithography. His work has had a profound impact on the efficiency and effectiveness of electron beam lithography processes.
Collaborations
Throughout his career, David has collaborated with notable colleagues, including Michael Stuart Gordon and Rodney A. Kendall. These collaborations have further enriched his contributions to the field.
Conclusion
David John Pinckney is a distinguished inventor whose work in electron beam lithography has led to significant advancements in the industry. His innovative patents reflect his commitment to improving technology and processes in this specialized field.