Novi, MI, United States of America

David J Santure

This inventor holds 16 USPTO granted patents, plus 4 CIPO patents and 1 EPO patent. Top assignees: Basf Lacke+farben Ag, Basf Corporation, Swimc LLC. Active years: 1990-2022.

IDiyas Innovation Intelligence. (2026). Inventor Profile: David J Santure. Retrieved from https://idiyas.com/inventor/david-j-santure

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0


 

Average Co-Inventor Count = 5.1

ph-index = 6

Forward Citations = 86(Granted Patents)


Location History:

  • 4400 Munster, DE (1990)
  • Munster, DE (1993 - 1996)
  • Northville, MI (US) (1996)
  • Novi, MI (US) (1993 - 2014)
  • Leechburgh, PA (US) (2018)
  • Gibsonia, PA (US) (2020 - 2022)

Company Filing History:


Years Active: 1990-2022

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16 patents (USPTO):Explore Patents

Title: The Innovative Journey of David J Santure

Introduction: David J Santure, a talented inventor hailing from Novi, MI (US), has made significant contributions to the world of innovations with his creative mind and dedication.

Latest Patents: David J Santure holds several patents in various fields, showcasing his versatility and ingenuity in inventing new solutions to existing problems.

Career Highlights: Throughout his career, David J Santure has demonstrated a keen eye for identifying gaps in the market and developing groundbreaking inventions to fill those voids. His passion for innovation has led to the creation of several successful products that have improved the lives of many.

Collaborations: David J Santure has collaborated with leading research institutions, universities, and companies to further his inventions and bring them to the market. His ability to work with diverse teams has been instrumental in the success of his projects.

Conclusion: In conclusion, David J Santure stands as a shining example of an inventor who has dedicated his life to pushing the boundaries of what is possible through innovation. His contributions have left a lasting impact on the world of inventions, inspiring future generations to continue the legacy of creativity and progress.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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