Midland, MI, United States of America

David J Rengering

This inventor holds 1 USPTO granted patent. Top assignee: Dow Corning Corporation. Active years: 1988.

IDiyas Innovation Intelligence. (2026). Inventor Profile: David J Rengering. Retrieved from https://idiyas.com/inventor/david-j-rengering

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 5(Granted Patents)


Company Filing History:


Years Active: 1988

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1 patent (USPTO):Explore Patents

Title: David J Rengering: Innovator in Alkoxysilanes Treatment

Introduction

David J Rengering is a notable inventor based in Midland, MI (US). He has made significant contributions to the field of chemical engineering, particularly in the treatment of alkoxysilanes. His innovative approach has implications for various applications, including electronics.

Latest Patents

Rengering holds a patent for a process that reduces residual chloride impurities in crude alkoxysilanes with atmospheric boiling points below 130°C. This process enhances the suitability of alkoxysilanes as starting intermediates for the preparation of other chemical compounds. The essence of his patented process involves contacting the alkoxysilane with an alkaline metal compound under superatmospheric pressure to achieve treatment temperatures exceeding 130°C.

Career Highlights

David J Rengering is associated with Dow Corning Corporation, where he has applied his expertise in chemical processes. His work has contributed to advancements in the production and application of alkoxysilanes in various industries.

Collaborations

Rengering has collaborated with notable colleagues, including Kenneth W Moorhead and Kirsten L Reading. These partnerships have fostered innovation and development in their respective fields.

Conclusion

David J Rengering's contributions to the treatment of alkoxysilanes exemplify the impact of innovative thinking in chemical engineering. His work continues to influence the industry and pave the way for future advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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