This inventor holds 1 USPTO granted patent and 2 published patent applications. Top assignee: 3M Innovative Properties Company. Active years: 2025.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2025
Title: The Innovative Contributions of David J Muradian
Introduction
David J Muradian is a notable inventor based in Saint Paul, MN (US). He has made significant contributions to the field of polishing technology, particularly through his innovative patent. His work exemplifies the intersection of creativity and engineering, showcasing how inventions can enhance existing technologies.
Latest Patents
David J Muradian holds a patent for a "Microreplicated polishing surface with enhanced co-planarity." This invention features a polishing layer that includes a plurality of raised cells separated by channels. Each raised cell is designed with a microstructured working surface, a substantially vertical channel surface, and an offset surface that connects the working surface to the channel surface. The microstructured working surface is characterized by a variety of microstructures, with the tops defining a top plane and the bases defining a base plane. The channel surfaces create a channel plane, while the offset surface includes a nonplanar portion of displaced material, which defines a displacement plane that is strategically positioned below the base plane or within a tolerance of the top plane. This innovative design aims to improve the efficiency and effectiveness of polishing processes.
Career Highlights
David J Muradian is associated with 3M Innovative Properties Company, where he has been able to apply his inventive skills in a collaborative environment. His work at 3M has allowed him to contribute to advancements in polishing technologies, which are crucial in various industrial applications.
Collaborations
Throughout his career, David has worked alongside talented colleagues, including Kenneth A P Meyer and John J Sullivan. These collaborations have fostered an environment of innovation and creativity, leading to the development of cutting-edge technologies.
Conclusion
David J Muradian's contributions to the field of polishing technology through his patent demonstrate the importance of innovation in enhancing industrial processes. His work continues to inspire future advancements in the industry.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile