Everett, WA, United States of America

David J Kehrl

This inventor holds 5 USPTO granted patents and 1 published patent application, plus 1 CIPO patent and 3 EPO patents. Top assignees: The Boeing Company, Ap Technology, LLC. Active years: 2012-2016.

USPTO Granted Patents = 5 

% Patents Active = 100.0


 

Average Co-Inventor Count = 2.7

ph-index = 3

Forward Citations = 36(Granted Patents)


Company Filing History:


Years Active: 2012-2016

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5 patents (USPTO):Explore Patents

Title: The Innovative Contributions of David J Kehrl

Introduction

David J Kehrl is a notable inventor based in Everett, WA (US), recognized for his contributions to engineering and design. With a total of 5 patents to his name, Kehrl has made significant advancements in the field of energy absorption and composite materials.

Latest Patents

One of his latest patents is the "Energy-absorbing deformable tube." This invention features a tube with a first end, a second end, and a reduced portion in between. The design allows for energy absorption when an axial force exceeds a predetermined threshold value. Another significant patent is for "Curved composite frames and method of making the same." This patent describes a curved composite aircraft frame that utilizes a multi-ply composite laminate with a Z-shaped cross section, enhancing the structural integrity of aircraft.

Career Highlights

Throughout his career, David J Kehrl has worked with prominent companies such as The Boeing Company and A&P Technology, Inc. His experience in these organizations has allowed him to develop innovative solutions that address complex engineering challenges.

Collaborations

Kehrl has collaborated with several talented individuals in his field, including Kent E Johnson and Douglas Alan McCarville. These partnerships have contributed to the successful development of his patented technologies.

Conclusion

David J Kehrl's work exemplifies the spirit of innovation in engineering. His patents reflect a commitment to advancing technology and improving safety in various applications.

Profile summary based on public USPTO records.
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