Aptos, CA, United States of America

David J Harra

This inventor holds 1 USPTO granted patent. Top assignee: Novellus Systems Incorporated. Active years: 1999.

IDiyas Innovation Intelligence. (2026). Inventor Profile: David J Harra. Retrieved from https://idiyas.com/inventor/david-j-harra-u4bh3k2y

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 22(Granted Patents)


Company Filing History:


Years Active: 1999

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1 patent (USPTO):Explore Patents

Title: David J Harra: Innovator in Magnetron Sputtering Technology

Introduction

David J Harra is a notable inventor based in Aptos, California. He has made significant contributions to the field of magnetron sputtering technology. His innovative work has led to the development of a unique patent that enhances the efficiency of sputtering apparatuses.

Latest Patents

David J Harra holds a patent for an "Internally cooled target assembly for magnetron sputtering." This invention features a cooling plate designed to promote highly turbulent coolant flow through the target assembly. The design achieves efficient and uniform cooling while minimizing the volume of coolant required.

Career Highlights

David is associated with Novellus Systems Incorporated, a company known for its advancements in semiconductor manufacturing technology. His work at Novellus has allowed him to focus on innovative solutions that improve production processes.

Collaborations

Throughout his career, David has collaborated with notable colleagues, including Larry D Hartsough and Ronald R Cochran. These partnerships have contributed to the development of cutting-edge technologies in the industry.

Conclusion

David J Harra's contributions to magnetron sputtering technology exemplify his innovative spirit and dedication to advancing manufacturing processes. His patent and work at Novellus Systems Incorporated highlight his role as a key figure in the field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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