Murarrie, Australia

David Hume

This inventor holds 3 USPTO granted patents. Top assignee: Cqms Pty Ltd. Active years: 2024.

IDiyas Innovation Intelligence. (2026). Inventor Profile: David Hume. Retrieved from https://idiyas.com/inventor/david-hume

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 6.0

ph-index = 2

Forward Citations = 4(Granted Patents)


Company Filing History:


Years Active: 2024

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3 patents (USPTO):Explore Patents

Title: David Hume: Innovator in Wear Technology

Introduction

David Hume is a notable inventor based in Murarrie, Australia. He has made significant contributions to the field of wear technology, holding a total of 3 patents. His work has been instrumental in advancing the understanding and application of wear members in various industries.

Latest Patents

Among his latest innovations is the patent for a "Wear Member," which showcases his expertise in developing solutions that enhance durability and performance in mechanical systems. This invention reflects his commitment to improving the efficiency and longevity of components subjected to wear.

Career Highlights

David Hume is currently employed at CQMS Pty Ltd, a company known for its focus on innovative solutions in the mining and resources sector. His role at CQMS Pty Ltd allows him to apply his inventive skills to real-world challenges, contributing to the company's reputation for excellence in engineering and technology.

Collaborations

Throughout his career, David has collaborated with talented individuals such as Samuel Beck and Ian Ashby. These partnerships have fostered a creative environment that encourages the exchange of ideas and the development of groundbreaking technologies.

Conclusion

David Hume's contributions to wear technology and his innovative spirit make him a significant figure in his field. His work continues to influence the industry, and his patents serve as a testament to his dedication to advancing technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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