Orlando, FL, United States of America

David Huibregtse

This inventor holds 2 USPTO granted patents. Top assignee: Lucent Technologies Inc.. Active years: 1999-2000.

IDiyas Innovation Intelligence. (2026). Inventor Profile: David Huibregtse. Retrieved from https://idiyas.com/inventor/david-huibregtse

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 2.7

ph-index = 2

Forward Citations = 8(Granted Patents)


Location History:

  • Clairmont, FL (US) (1999)
  • Orlando, FL (US) (2000)

Company Filing History:


Years Active: 1999-2000

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2 patents (USPTO):Explore Patents

Title: David Huibregtse: Innovator in Semiconductor Technology

Introduction

David Huibregtse is a notable inventor based in Orlando, FL (US). He has made significant contributions to the field of semiconductor technology, holding 2 patents that showcase his innovative approach to solving complex problems in this area.

Latest Patents

One of his latest patents is titled "Device and method of decreasing circular defects and charge buildup." This invention provides an apparatus and method for decreasing circular defects and charge buildup on a semiconductor wafer that has a photoresist formed on it. The method involves positioning a semiconductor wafer in a track developer and applying a photoresist developer at a predetermined speed. The initial speed is then increased to a range of about 400 rpm to 800 rpm. During the rinsing process, the photoresist is removed from the semiconductor while a back spray is applied to the second side of the semiconductor. Additionally, the semiconductor wafer is subjected to a flow of ions from an ionization source within the tracking device itself. This ionization is a significant advantage over prior art systems, as it reduces the charge buildup associated with increased spin speeds.

Another important patent by Huibregtse is related to "Integrated circuit fabrication." This invention focuses on coating the quartz shadow ring of a conventional plasma etching apparatus with material that inhibits the liberation of oxygen into the plasma. Research has shown that liberated oxygen can degrade etching uniformity across the wafer, making this innovation crucial for improving manufacturing processes.

Career Highlights

David Huibregtse has had a successful career at Lucent Technologies Inc., where he has applied his expertise in semiconductor technology. His work has contributed to advancements in the field, particularly in improving the efficiency and effectiveness of semiconductor manufacturing processes.

Collaborations

Throughout his career, Huibregtse has collaborated with notable colleagues, including John G Costigan and Donald Stephen Bitting. These collaborations have likely enriched his work and contributed to the innovative solutions he has developed.

Conclusion

David Huibregtse is a distinguished inventor whose work in semiconductor technology has led to significant advancements in the field. His patents reflect a commitment to innovation and problem-solving, making him a valuable contributor to the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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