Eugene, OR, United States of America

David Hong

This inventor holds 4 USPTO granted patents. Top assignees: Hewlett-Packard Development Company, L.p., Oregon State University. Active years: 2006-2009.

IDiyas Innovation Intelligence. (2026). Inventor Profile: David Hong. Retrieved from https://idiyas.com/inventor/david-hong-m9jaecvl

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 4.7

ph-index = 4

Forward Citations = 351(Granted Patents)


Company Filing History:


Years Active: 2006-2009

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4 patents (USPTO):Explore Patents

Title: David Hong: Innovator in Semiconductor Technology

Introduction

David Hong is a prominent inventor based in Eugene, OR (US). He has made significant contributions to the field of semiconductor technology, holding a total of 4 patents. His work has been influential in advancing the capabilities of semiconductor devices.

Latest Patents

Among his latest patents, David has developed a semiconductor device that includes a channel made of a zinc-indium oxide film. This innovative approach enhances the performance and efficiency of semiconductor applications. His dedication to improving semiconductor technology is evident in his repeated focus on this material in his patents.

Career Highlights

David has had a distinguished career, working with notable organizations such as Hewlett-Packard Development Company, L.P. and Oregon State University. His experience in these institutions has allowed him to collaborate with leading experts in the field and contribute to groundbreaking research.

Collaborations

Throughout his career, David has worked alongside talented individuals, including Hai Q Chiang and Randy Hoffman. These collaborations have further enriched his work and expanded the impact of his inventions.

Conclusion

David Hong is a key figure in the semiconductor industry, with a strong portfolio of patents and a history of collaboration with esteemed organizations and individuals. His contributions continue to shape the future of semiconductor technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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