David Han

Title: David Han - Innovator in Semiconductor Technology

Introduction

David Han is a prominent inventor based in Shanghai, China. He has made significant contributions to the field of semiconductor technology. His innovative work has led to the development of a unique patent that enhances manufacturing processes in the industry.

Latest Patents

David Han holds a patent for a "Gate structure and manufacturing method thereof." This patent outlines a method for manufacturing a gate structure that includes several intricate steps. The process begins with providing a stack on a substrate, which consists of various layers including a dummy layer, TiN layers, a TaN layer, a high-k dielectric layer, and an interfacial layer. The method involves etching the stack to create a remaining structure, applying an etching stop layer, and performing planarization. The final steps include removing specific layers through dry and wet etching processes, culminating in the addition of a metal gate layer.

Career Highlights

David is currently employed at Semiconductor Manufacturing International Corporation, a leading company in the semiconductor industry. His work focuses on advancing manufacturing techniques that improve efficiency and performance in semiconductor devices.

Collaborations

David collaborates with talented coworkers, including Aileen Li and Jinghua Ni. Their combined expertise contributes to the innovative projects at Semiconductor Manufacturing International Corporation.

Conclusion

David Han is a key figure in semiconductor innovation, with a patent that showcases his expertise in manufacturing methods. His contributions continue to influence the industry positively.