Company Filing History:
Years Active: 1986-1996
Title: Innovations of David H. Leebrick
Introduction
David H. Leebrick is a notable inventor based in Palm Bay, FL (US). He has made significant contributions to the field of semiconductor technology, holding 2 patents that showcase his innovative approaches.
Latest Patents
His latest patents include a fill and etchback process using a dual photoresist sacrificial layer. This process involves forming a composite photoresist sacrificial layer on an oxide-filled structure, which contains photoresist plugs that are reflowed to fill depressions in the oxide fill layer. The method effectively planarizes the depression-filled trench oxide layer, ensuring that the top surface of the trench fill oxide layer extends above the mesa layer to prevent shorting of a subsequently formed polysilicon gate layer. Another patent focuses on a method of determining position on a wafer, which includes an alignment system with a target pattern formed on a semiconductor wafer. This system scans the target pattern to produce signals that represent dimensions and distances between features, allowing for precise determination of the scanning position relative to a reference position.
Career Highlights
David is currently employed at Harris Corporation, where he applies his expertise in semiconductor technology. His work has contributed to advancements in the industry, particularly in the areas of photoresist processes and alignment systems.
Collaborations
He has collaborated with notable coworkers such as Jeanne Marie McNamara and Deborah K. Rodriguez, further enhancing the innovative environment at Harris Corporation.
Conclusion
David H. Leebrick's contributions to semiconductor technology through his patents and work at Harris Corporation highlight his role as a significant inventor in the field. His innovative methods continue to influence advancements in the industry.