The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 28, 1986
Filed:
Aug. 24, 1983
David H Leebrick, Palm Bay, FL (US);
Harris Corporation, Melbourne, FL (US);
Abstract
An alignment system and method is provided having an alignment target pattern formed on a semiconductor wafer, with means for scanning that target pattern to produce signals representing dimensions of individual features therein and distances between adjacent features, and with means for interrogating these signals to determine the relative position and distance of the scanned portion of the target pattern from a predetermined reference position. The target pattern includes one or more series of concentric figures, each figure having a particular dimension which differs from the particular dimension of each adjacent figure by a predetermined magnitude and being spaced from adjacent figures by predetermined distances. These predetermined distances and magnitude are detected from the scanning means signals and are used to determine the distance and direction of the scanning position from a reference position.