Edmonton, Canada

David Grant Rusnell

This inventor holds 1 USPTO granted patent. Top assignee: R/d Tech Inc.. Active years: 2002.


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 2002

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1 patent (USPTO):Explore Patents

Title: David Grant Rusnell: Innovator in Magnetic Inspection Technology

Introduction

David Grant Rusnell is a notable inventor based in Edmonton, Canada. He has made significant contributions to the field of magnetic inspection technology, particularly in the inspection of ferrous conduits for wear. His innovative approach has led to the development of a unique apparatus that enhances the efficiency and accuracy of inspections.

Latest Patents

David Grant Rusnell holds a patent for a "Method and apparatus for magnetic inspection of ferrous conduit for wear." This invention features a housing with a conduit travel passage, at least one coil positioned to create a transverse flux component, and a sensor array designed to detect flux patterns. The integration of a computer to interpret signals from the sensor array further enhances the functionality of this apparatus. He has 1 patent to his name.

Career Highlights

Throughout his career, Rusnell has demonstrated a commitment to advancing inspection technologies. His work at R/D Tech Inc. has positioned him as a key player in the industry. His innovative solutions have not only improved inspection processes but have also contributed to safety and reliability in various applications.

Collaborations

David has collaborated with talented individuals such as Timothy Dayn Rogers and William John Woods. These partnerships have fostered a creative environment that encourages the development of cutting-edge technologies.

Conclusion

David Grant Rusnell's contributions to magnetic inspection technology exemplify the spirit of innovation. His patent and collaborative efforts reflect a dedication to improving industry standards and practices. His work continues to influence the field and inspire future advancements.

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