Company Filing History:
Years Active: 1996-1998
Title: The Innovations of David Garth Emery: Pioneering Photomask Inspection Technology
Introduction: David Garth Emery, an accomplished inventor based in San Jose, CA, has made significant contributions to the field of optical technology with his innovative patent developments. With a total of two patents to his name, Emery has focused his efforts on improving the inspection processes for patterned transmissive substrates, particularly in the realm of photomasks.
Latest Patents: Emery's latest invention is an automated photomask inspection apparatus and method. This innovative system is designed to inspect patterned transmissive substrates, such as photomasks, for unwanted particles and features. The method utilizes a laser illumination through a sophisticated optical system, which includes a laser scanning system along with individual transmissive and reflective light collection optics. During the imaging process, the substrate is scanned repeatedly in a serpentine pattern. The system efficiently collects signals representative of the transmitted and reflected light, allowing for comprehensive defect identification. This identification is conducted by analyzing derived signals and comparing combinations to accurately pinpoint defects while simultaneously inspecting for particles and measuring phase shifts and line widths. This dual-purpose function enhances the reliability and efficiency of photomask inspections.
Career Highlights: Emery's career is marked by his dedication to advancing optical inspection technologies at Kla Instruments Corporation. His innovative work has positioned him as a leading figure in the industry, showcasing his ability to blend theoretical knowledge with practical applications.
Collaborations: Throughout his career, Emery has collaborated with talented colleagues, including Zain Kahuna Saidin and Mark Joseph Wihl. These partnerships have enriched his work environment and contributed to the successful development and implementation of cutting-edge technologies in the field.
Conclusion: David Garth Emery exemplifies the spirit of innovation in the realm of photomask inspection technologies. With his valuable patents and collaborative expeditions at Kla Instruments Corporation, he continues to influence the future of optical systems and defect inspection processes. Emery’s dedication to his work ensures that his contributions to the field will have lasting effects on both industry practices and technological advancements.