San Jose, CA, United States of America

David G Grasso

USPTO Granted Patents = 2 

Average Co-Inventor Count = 3.0

ph-index = 2

Forward Citations = 21(Granted Patents)


Company Filing History:


Years Active: 1994-1995

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2 patents (USPTO):Explore Patents

Title: David G Grasso: Innovator in Semiconductor Technology

Introduction

David G Grasso is a notable inventor based in San Jose, CA. He has made significant contributions to the field of semiconductor technology, holding 2 patents that showcase his innovative approach to solving complex engineering challenges.

Latest Patents

One of his latest patents is focused on a low temperature oxide layer over a field implant mask. This invention involves a thin base oxide that is disposed over both an active area and a field area of a substrate. A thin silicon-nitride layer is formed over the base oxide in the active area to protect the underlying substrate from oxygen and/or water vapor during a subsequent field oxidation step. The thin nitride layer is not thick enough to serve as a field implant mask in a subsequent field implant step. Therefore, an additional low temperature oxide (LTO) layer is provided over the nitride layer in the active area. The field implant step is performed using the base oxide, the thin nitride, and the overlying LTO as a field implant mask. The boundaries of the overlying LTO define a field implant boundary. After the field implant step but before the field oxidation step, the LTO layer is removed from the top of the thin nitride layer. As a result, only the base oxide and the thin nitride layer is disposed over the active area during field oxidation. This method reduces the amount of stress induced in the nitride layer, minimizing problems associated with thick nitride layers, such as the introduction of lattice defects into the underlying silicon substrate. The thin nitride process may be incorporated into a BiCDMOS process.

Career Highlights

David G Grasso has built a successful career at Siliconix Incorporated, where he has been able to apply his innovative ideas in practical applications. His work has significantly impacted the semiconductor industry, particularly in the development of advanced materials and processes.

Collaborations

Throughout his career, David has collaborated with talented individuals such as Mike F Chang and Jun-Wei Chen. These collaborations have further enhanced his contributions to the field and fostered a spirit of innovation within his team.

Conclusion

David G Grasso is a distinguished inventor whose work in semiconductor technology continues to influence the industry. His innovative patents and collaborative efforts demonstrate his commitment to advancing technology and solving complex engineering problems.

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