David Eugene Aberle

Title: David Eugene Aberle: Innovator in Ion Implantation Technology

Introduction

David Eugene Aberle is a notable inventor based in Milpitas, CA (US). He has made significant contributions to the field of ion implantation technology, holding a total of 2 patents. His work focuses on improving the accuracy and performance of ion implanters, which are essential in semiconductor manufacturing.

Latest Patents

Aberle's latest patents include a method for determining dose uniformity of a scanning ion implanter. This method involves measuring a base beam current at the beginning and/or end of a complete scan over the substrate area. By calculating a base dose distribution map and detecting beam instability events during the scan, Aberle's approach allows for a corrected distribution map that enhances overall accuracy.

Another significant patent is a method for obtaining a performance parameter for an ion implanter. This method monitors vacuum pressure in the implanter's vacuum chamber to identify pressure pulses caused by outgassing from wafer surfaces. By integrating pressure values during these pulses, Aberle provides a series of pulse pressure integral values that indicate the performance of the vacuum system. An increase in these values signals a deterioration in performance, which is crucial for maintaining optimal operation.

Career Highlights

David Aberle is currently employed at Applied Materials, Inc., a leading company in the semiconductor equipment industry. His innovative work has contributed to advancements in ion implantation processes, which are vital for producing high-quality semiconductor devices.

Collaborations

Throughout his career, Aberle has collaborated with talented professionals, including Biagio Gallo and Jonathon Simmons. These collaborations have fostered an environment of innovation and have led to the development of cutting-edge technologies in the field.

Conclusion

David Eugene Aberle's contributions to ion implantation technology through his patents and work at Applied Materials, Inc. highlight his role as a key innovator in the semiconductor industry. His methods for improving dose uniformity and performance parameters are essential for advancing semiconductor manufacturing processes.