Oxon, United Kingdom

David Edward Williams

This inventor holds 1 USPTO granted patent. Top assignee: City Technology Limited. Active years: 2006.

IDiyas Innovation Intelligence. (2026). Inventor Profile: David Edward Williams. Retrieved from https://idiyas.com/inventor/david-edward-williams-tuqtt540

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 5(Granted Patents)


Company Filing History:


Years Active: 2006

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1 patent (USPTO):Explore Patents

Title: David Edward Williams: Innovator in Gas Sensor Technology

Introduction

David Edward Williams is a notable inventor based in Oxon, GB. He has made significant contributions to the field of gas sensor technology, particularly focusing on improving the performance of these sensors in challenging environments.

Latest Patents

Williams holds a patent for "Gas sensors with improved resistance to humidity interference - Semiconductor gas-sensitive materials of the formula CrTiO where 0.05 > x ≥ 0.0001, and gas sensors formed therefrom." This innovation addresses critical issues related to humidity interference, enhancing the reliability of gas sensors in various applications.

Career Highlights

Williams is currently employed at City Technology Limited, a company known for its advancements in gas sensing technologies. His work has been instrumental in developing sensors that are not only effective but also resilient in fluctuating environmental conditions.

Collaborations

Throughout his career, Williams has collaborated with esteemed colleagues, including Keith Francis Edwin Pratt and Peter John Smith. These partnerships have fostered a creative environment that encourages innovation and the sharing of ideas.

Conclusion

David Edward Williams is a prominent figure in the field of gas sensor technology, with a focus on enhancing sensor performance through innovative materials. His contributions continue to impact the industry positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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