Location History:
- Newtown, CT (US) (1999 - 2001)
- Newton, CT (US) (2002)
Company Filing History:
Years Active: 1999-2002
Title: Innovations of David E Speed
Introduction
David E Speed is a notable inventor based in Newton, CT (US). He has made significant contributions to the field of semiconductor printing, holding a total of 4 patents. His work focuses on developing environmentally friendly solutions for cleaning processes in semiconductor manufacturing.
Latest Patents
One of his latest patents is titled "Aqueous quaternary ammonium hydroxide as a screening mask cleaner." This invention addresses the cleaning of objects related to semiconductor printing, specifically screening masks. It is designed to remove organic polymer-metal composite paste from these masks, which are used in printing conductive metal patterns onto ceramic green sheets for semiconductor packaging substrates. The invention emphasizes automated in-line cleaning using an aqueous alkaline solution of quaternary ammonium hydroxide, presenting a more environmentally friendly alternative to traditional non-aqueous organic solvent-based cleaning methods.
Career Highlights
David E Speed is currently associated with International Business Machines Corporation (IBM). His work at IBM has allowed him to innovate and contribute to advancements in semiconductor technology.
Collaborations
Some of his notable coworkers include Krishna Gandhi Sachdev and Michael E Cropp. Their collaboration has likely fostered a creative environment that encourages innovation and the development of new technologies.
Conclusion
David E Speed's contributions to the field of semiconductor printing and his focus on environmentally friendly cleaning solutions highlight his commitment to innovation. His work continues to influence the industry positively.