The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 07, 2000
Filed:
Feb. 26, 1999
Jon A Casey, Poughkeepsie, NY (US);
Michael E Cropp, Lagrangeville, NY (US);
Donald W DiAngelo, Fishkill, NY (US);
John F Harmuth, Pleasant Valley, NY (US);
John U Knickerbocker, Hopewell Junction, NY (US);
David C Long, Wappingers Falls, NY (US);
Daniel S Mackin, Pleasant Valley, NY (US);
Glenn A Pomerantz, Kerhonkson, NY (US);
Krishna G Sachdev, Hopewell Junction, NY (US);
David E Speed, Newtown, CT (US);
Candace A Sullivan, Pleasant Valley, NY (US);
Robert J Sullivan, Pleasant Valley, NY (US);
Bruce E Tripp, Rhinebeck, NY (US);
James C Utter, Fishkill, NY (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
A cleaning method and related apparatus for cleaning semiconductor screening masks using an aqueous alkali detergent solution applied under high pressure simultaneously from both sides of the mask, followed by a drying step that uses air knives to blow off the mask surface any residual cleaner solution.