Colchester, United Kingdom

David E Lothian

This inventor holds 3 USPTO granted patents. Top assignees: Bexford Limited Imperial Chemical House, Bedford Limited. Active years: 1978-1980.

IDiyas Innovation Intelligence. (2026). Inventor Profile: David E Lothian. Retrieved from https://idiyas.com/inventor/david-e-lothian

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 1978-1980

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3 patents (USPTO):Explore Patents

Title: David E Lothian: Innovator in Imaging Materials

Introduction

David E Lothian is a notable inventor based in Colchester, GB. He has made significant contributions to the field of imaging materials, holding a total of 3 patents. His work has advanced the understanding and application of light-sensitive materials in various technologies.

Latest Patents

Among his latest patents are innovative developments such as light-sensitive vesicular imaging materials and vesicular recording materials that feature an adhesive layer. These inventions showcase his expertise in creating materials that enhance imaging capabilities.

Career Highlights

Throughout his career, David has worked with several prominent companies, including Bexford Limited and Imperial Chemical House. His experience in these organizations has allowed him to refine his skills and contribute to groundbreaking projects in the field of imaging.

Collaborations

David has collaborated with notable professionals in his field, including Roy F Huffey and Stuart C Rennison. These partnerships have fostered a creative environment that has led to the development of innovative solutions in imaging technology.

Conclusion

David E Lothian's contributions to the field of imaging materials are significant and impactful. His patents and collaborations reflect his dedication to innovation and advancement in technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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