David E Hart

Title: David E Hart: Innovating Semiconductor Technology

Introduction

David E Hart is an accomplished inventor based in Cornelius, OR, with a notable portfolio of four patents. His innovative contributions primarily reside in semiconductor devices, where he has focused on enhancing performance and efficiency through advanced designs.

Latest Patents

One of David's latest inventions is the Strapped Dual-Gate VDMOS Device. This groundbreaking semiconductor device features a dual-gate configuration that includes a substrate with both a first and a second surface. The design incorporates two body regions near the first surface, each containing a source region, while a drain region is positioned near the second surface. A critical aspect of this innovation is the epitaxial region functioning as a drift region between the drain and source regions. The dual-gate includes two distinct gate regions that form a gap to minimize gate to drain capacitance, with an added conductive layer that effectively reduces the resistance of the dual-gate.

Career Highlights

David E Hart has had a distinguished career working at prominent semiconductor companies. He has contributed his expertise at Maxim Integrated Products, Inc. and Triquint Semiconductor Corporation, where he played a pivotal role in developing advanced semiconductor solutions.

Collaborations

Throughout his career, David has collaborated with talented professionals in the industry, including Sudarsan Uppili and Guillaume Bouche. These collaborations have been instrumental in fostering innovation and pushing the boundaries of semiconductor technology.

Conclusion

David E Hart's contributions to the field of semiconductor devices are invaluable. With his innovative patents and notable collaborations, he continues to influence the industry, paving the way for future advancements in technology. His work exemplifies the spirit of innovation that drives progress in the field of electronics.