Neftenbach, Switzerland

David Dreher

This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignee: Priamus System Technologies Ag. Active years: 2009.

IDiyas Innovation Intelligence. (2026). Inventor Profile: David Dreher. Retrieved from https://idiyas.com/inventor/david-dreher

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0


Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 9(Granted Patents)


Company Filing History:


Years Active: 2009

Loading Chart...
Loading Chart...
1 patent (USPTO):Explore Patents

Title: David Dreher - Innovator in Object Formation Technology

Introduction

David Dreher is a notable inventor based in Neftenbach, Switzerland. He has made significant contributions to the field of object formation technology, particularly through his innovative patent.

Latest Patents

Dreher holds a patent for a "Device for forming objects, comprising a couplable pressure or temperature sensor." This device is designed to form objects within a cavity, utilizing an insert in a molding plate. The invention features a sensor positioned in the insert, directed towards the inner wall of the cavity. This sensor is connected to a first coupling part, which associates with a second coupling part in the molding plate.

Career Highlights

David Dreher is currently employed at Priamus System Technologies AG, where he continues to develop and refine technologies related to object formation. His work has been instrumental in advancing the capabilities of molding processes.

Collaborations

Dreher collaborates with Christopherus Bader, contributing to the innovative environment at Priamus System Technologies AG.

Conclusion

David Dreher's contributions to the field of object formation technology highlight his role as an influential inventor. His patent and ongoing work at Priamus System Technologies AG demonstrate his commitment to innovation in this area.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…