Ashland, MA, United States of America

David Daiute

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Airflow Research and Manufacturing Corporation. Active years: 1991.

IDiyas Innovation Intelligence. (2026). Inventor Profile: David Daiute. Retrieved from https://idiyas.com/inventor/david-daiute

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 31(Granted Patents)


Company Filing History:


Years Active: 1991

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1 patent (USPTO):Explore Patents

Title: David Daiute and the Variable Skew Fan

Introduction

David Daiute is an inventor associated with Ashland, Massachusetts, and Airflow Research and Manufacturing Corporation. His patent work includes an axial-flow fan design intended to reduce noise while maintaining dynamic performance.

Latest Patents

Daiute is credited with 1 patent: “Variable Skew Fan.” The invention describes an axial-flow fan with a central hub and blades extending from it. The blades are evenly spaced near the hub, but their curvature varies so that the spacing between some neighboring blade tips is unequal. This uneven spacing near the tips is designed to reduce noise, while the even spacing and high solidity near the hub help maintain dynamic performance where nondimensional loading is highest.

Career Highlights

Daiute’s listed patent reflects work on fan blade geometry and the balance between acoustic performance and airflow dynamics. He is associated with Airflow Research and Manufacturing Corporation.

Collaborations

Robert J. Van Houten is identified as Daiute’s coworker. The available information does not specify their particular roles or contributions to the patent.

Conclusion

David Daiute’s “Variable Skew Fan” patent presents a blade-spacing approach designed to reduce noise near the tips while preserving performance near the hub.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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