Los Angeles, CA, United States of America

David C Pearson


Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 120(Granted Patents)


Company Filing History:


Years Active: 1992

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1 patent (USPTO):Explore Patents

Title: Innovator Spotlight: David C. Pearson and His Contributions to Plasma Technology

Introduction: David C. Pearson, an inventive mind based in Los Angeles, CA, has made significant contributions to the field of plasma technology. With a focus on high-density plasma deposition and etching, his work has profound implications for various industries.

Latest Patents: Pearson holds a patent for a "High Density Plasma Deposition and Etching Apparatus." This innovative apparatus generates a high-density ionized plasma through a unique design involving a single loop positioned in a plane that intersects the central axis of the source chamber. By utilizing a longitudinal magnetic field and injecting inert or reactive gases, the system is capable of establishing various excitation modes that create uniform and high-density plasma. This plasma source is further employed in process chamber configurations that enhance plasma distribution, making it essential for precise etching, deposition, or sputtering on substrates.

Career Highlights: David C. Pearson's career has been marked by his commitment to advancing plasma technology. He is currently working at Plasma & Materials Technologies, Inc., where he plays a crucial role in the development of innovative materials and processes. His expertise has not only resulted in patented technologies but has also paved the way for enhanced manufacturing techniques across different sectors.

Collaborations: Throughout his career, Pearson has collaborated with colleagues such as Gregor A. Campbell and Robert W. Conn. These partnerships have fostered a dynamic research environment, allowing for the exchange of ideas and the development of cutting-edge technologies in plasma applications.

Conclusion: David C. Pearson stands out as an accomplished inventor whose work in high-density plasma technology continues to influence various industries. His inventive spirit and collaborative approach exemplify the impact of innovation in the realm of materials science, offering new opportunities for advancements in manufacturing and processing techniques.

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