Alpharetta, GA, United States of America

David C Novakoski

This inventor holds 1 USPTO granted patent. Top assignee: Cabot Corporation. Active years: 1995.

IDiyas Innovation Intelligence. (2026). Inventor Profile: David C Novakoski. Retrieved from https://idiyas.com/inventor/david-c-novakoski

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 13(Granted Patents)


Company Filing History:


Years Active: 1995

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1 patent (USPTO):Explore Patents

Title: The Innovations of David C Novakoski

Introduction

David C Novakoski is an accomplished inventor based in Alpharetta, GA. He has made significant contributions to the field of rubber compositions, particularly focusing on reducing gas permeability. His innovative work has led to the development of a patented technology that enhances the performance of rubber materials.

Latest Patents

David holds a patent for "Low permeability rubber compositions." This invention involves rubber compositions that have reduced permeability to gases, incorporating specific furnace carbon blacks. This advancement is crucial for various applications where gas retention is essential.

Career Highlights

David is currently employed at Cabot Corporation, a leading company in the specialty chemicals and performance materials sector. His role at Cabot allows him to leverage his expertise in rubber technology and contribute to the company's innovative projects.

Collaborations

David collaborates with talented professionals in his field, including his coworker Stephen G Laube. Together, they work on advancing rubber technology and exploring new applications for their inventions.

Conclusion

David C Novakoski's contributions to rubber compositions demonstrate his commitment to innovation and excellence in his field. His patented work continues to influence the industry and showcases the importance of research and development in creating advanced materials.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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