Company Filing History:
3 out of 4,992 
2 out of 94 
Years Active: 1989-1996
Title: David C Look: Innovator in GaAs Measurement Technologies
Introduction
David C Look is a prominent inventor based in Dayton, OH (US), known for his significant contributions to the field of semiconductor technology. He holds a total of 5 patents, showcasing his innovative approach to nondestructive measurement techniques in Gallium Arsenide (GaAs) wafers.
Latest Patents
One of his latest patents is a method for nondestructive measurement of dislocation density in GaAs. This method involves testing an unetched GaAs wafer for fractional transmission of light at various points on its surface. A light beam is passed through a monochromator and focused on the wafer, allowing for the detection of fractional transmission values. The absorption coefficient is calculated, and regions of dislocation density are determined nondestructively from the absorption data. A histogram is plotted to visualize the distribution of absorption values, leading to the identification of dislocated regions in the wafer.
Another notable patent is the on-wafer Hall-effect measurement system. This non-destructive measurement system produces whole wafer maps of sheet Hall concentration and Hall mobility in GaAs wafers. The system utilizes an automatic test prober apparatus modified with a powerful permanent magnet to create a magnetic field, enabling the measurement of sheet resistivity, Hall voltage, and magnetic field strength. The derived values are then stored and mapped for analysis.
Career Highlights
David C Look has worked with esteemed organizations, including the United States of America as represented by the Secretary of the Air Force and Wright State University. His work has significantly advanced the understanding and measurement of semiconductor materials.
Collaborations
Throughout his career, David has collaborated with notable individuals such as Eileen Pimentel and Millard G Mier. These collaborations have contributed to the development of innovative measurement techniques in the semiconductor industry.
Conclusion
David C Look's contributions to the field of GaAs measurement technologies have established him as a key figure in semiconductor innovation. His patents reflect a commitment to advancing nondestructive measurement methods, which are crucial for the development of high-quality semiconductor devices.