Bloomfield Hills, MI, United States of America

David C K Chang

This inventor holds 1 USPTO granted patent. Top assignee: E.i. Dupont De Nemours and Company. Active years: 2004.

IDiyas Innovation Intelligence. (2026). Inventor Profile: David C K Chang. Retrieved from https://idiyas.com/inventor/david-c-k-chang

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 4(Granted Patents)


Company Filing History:


Years Active: 2004

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1 patent (USPTO):Explore Patents

Title: David C K Chang: Innovator in Electrically Conductive Coatings

Introduction

David C K Chang is an accomplished inventor based in Bloomfield Hills, MI (US). He has made significant contributions to the field of electrically conductive materials. His innovative work has led to the development of a unique patent that enhances the application of conductive coatings.

Latest Patents

David C K Chang holds a patent for "Electrically conductive coatings applied by internally charged electrostatic sprayers." This invention provides compositions that include graphite, a binder precursor, and a low polarity solvent. Upon hardening, these compositions form layers of electrically conductive material. The innovative aspect of this invention is that the compositions can be sprayable by an internally charged electrostatic sprayer.

Career Highlights

David C K Chang is associated with E.I. du Pont de Nemours and Company, a leading organization in the field of materials science. His work at this company has allowed him to focus on developing advanced materials that have practical applications in various industries.

Collaborations

David has collaborated with notable coworkers, including Monica A Pickett and Aleksandr Sorser. These collaborations have contributed to the advancement of his research and the successful development of his patented technologies.

Conclusion

David C K Chang is a notable inventor whose work in electrically conductive coatings has the potential to impact various industries. His innovative approach and collaboration with talented colleagues highlight his commitment to advancing material science.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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