Whitehouse, OH, United States of America

David C Hinson

This inventor holds 3 USPTO granted patents. Top assignee: Owens-Illinois, Inc.. Active years: 1976-1977.


% Patents Active = 100.0

Average Co-Inventor Count = 1.9

ph-index = 2

Forward Citations = 54(Granted Patents)


Company Filing History:


Years Active: 1976-1977

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3 patents (USPTO):Explore Patents

Title: Innovations of David C Hinson

Introduction

David C Hinson is a notable inventor based in Whitehouse, Ohio, with a focus on advancements in gas discharge devices. He holds three patents that showcase his contributions to the field of technology and innovation.

Latest Patents

Hinson's latest patents include a phosphor overcoat designed to enhance the life of phosphors in gas discharge devices. This invention involves a gas discharge device containing electrode arrays and an ionizable gaseous medium, where the phosphor is excited by radiation from the gas discharge. The phosphor overcoat is selected from alkali and alkaline earth fluorides, improving the phosphor's longevity. Another significant patent is for a glow discharge device gas mixture, which consists of 20 to 35 percent argon atoms and 65 to 80 percent xenon-based composition. This mixture is particularly beneficial for color phosphor, direct current gas discharge devices, as it lowers operating currents while providing effective phosphor stimulation.

Career Highlights

David C Hinson is associated with Owens-Illinois, Inc., where he has made significant contributions to the development of innovative technologies in the field of gas discharge devices. His work has been instrumental in advancing the efficiency and effectiveness of these devices.

Collaborations

Hinson has collaborated with notable coworkers, including Wolfgang W Bode and Michael E Fein, contributing to various projects that enhance the functionality of gas discharge technologies.

Conclusion

David C Hinson's innovative work in gas discharge devices and his patents reflect his commitment to advancing technology in this field. His contributions continue to influence the development of efficient and effective gas discharge solutions.

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