Austin, TX, United States of America

David C Greenlaw


Average Co-Inventor Count = 2.5

ph-index = 4

Forward Citations = 205(Granted Patents)


Location History:

  • Austin, TX (US) (1999 - 2000)
  • Portola Valley, CA (US) (1999 - 2001)

Company Filing History:


Years Active: 1999-2001

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5 patents (USPTO):Explore Patents

Title: David C Greenlaw: Innovator in Semiconductor Technology

Introduction

David C Greenlaw is a prominent inventor based in Austin, TX (US). He has made significant contributions to the field of semiconductor technology, holding a total of 5 patents. His work focuses on innovative methods that enhance the performance and efficiency of semiconductor devices.

Latest Patents

One of Greenlaw's latest patents is titled "Process to separate the doping of polygate and source drain regions in dual gate field effect transistors." This invention presents a method for independently doping the gate and the source-drain regions of a semiconductor device. The process begins with a substrate that has isolation regions and a thin insulating layer. A polysilicon layer is formed over the substrate, doped with a first type of dopant at a specific level. A conducting layer, capable of withstanding temperatures of 1000°C, is then added, followed by a blocking layer. The layers are etched to create a gate stack, and the source-drain regions are doped with a second type of dopant. This method minimizes substrate damage and prevents shorting a source-drain contact region to the substrate.

Another notable patent involves "Borderless vias with CVD barrier layer." In this invention, borderless vias are filled by initially depositing a thin, conformal layer of titanium nitride through chemical vapor deposition. This layer covers an undercut, etched side surface of a lower metal feature. Subsequently, a metal such as tungsten is deposited to fill the borderless via. The process includes thermal decomposition of an organic-titanium compound and treatment of the deposited titanium nitride in an H₂/N₂ plasma to reduce its resistivity.

Career Highlights

David C Greenlaw is currently employed at Advanced Micro Devices Corporation, a leading company in the semiconductor industry. His work at AMD has allowed him to push the boundaries of semiconductor technology and contribute to advancements in the field.

Collaborations

Throughout his career, Greenlaw has collaborated with notable colleagues, including Scott D Luning and Robert C Chen. These collaborations have fostered innovation and have been instrumental in the development of new technologies.

Conclusion

David C Greenlaw is a distinguished inventor whose work in semiconductor technology has led to significant advancements. His innovative patents and contributions to Advanced Micro Devices Corporation highlight his impact on the industry.

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