Plymouth, MI, United States of America

David Beatson

This inventor holds 1 USPTO granted patent. Top assignee: Rofin-Sinar Technologies LLC. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: David Beatson. Retrieved from https://idiyas.com/inventor/david-beatson

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: David Beatson - Innovator in Scanning Laser Technology

Introduction

David Beatson is a notable inventor based in Plymouth, MI (US). He has made significant contributions to the field of laser technology, particularly with his innovative scanning laser apparatus. His work has implications for enhancing efficiency in various industrial applications.

Latest Patents

David Beatson holds a patent for a "Scanning laser apparatus addressing two workstations." This invention features a 2D laser beam scanner and a roof reflector with two reflective surfaces. The design allows the laser beam to be directed alternately to two workstations, facilitating high throughput by enabling simultaneous processing of workpieces.

Career Highlights

David is associated with Rofin-Sinar Technologies LLC, where he applies his expertise in laser technology. His innovative approach has led to advancements in the efficiency of laser processing systems. With 1 patent to his name, he continues to contribute to the field through his work and research.

Collaborations

David collaborates with Matthew R Kole, leveraging their combined expertise to push the boundaries of laser technology. Their partnership exemplifies the importance of teamwork in driving innovation.

Conclusion

David Beatson's contributions to scanning laser technology highlight his role as an inventor dedicated to improving industrial processes. His innovative patent serves as a testament to his commitment to advancing technology in this field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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