Company Filing History:
Years Active: 2017-2019
Title: Innovations by David A Rauth
Introduction
David A Rauth is an accomplished inventor based in Riverton, NJ (US). He has made significant contributions to the field of semiconductor technology, holding a total of 2 patents. His work focuses on innovative methods for measuring physical characteristics of semiconductor device elements.
Latest Patents
One of David A Rauth's latest patents is titled "Systems and methods for measuring physical characteristics of semiconductor device elements using structured light." This patent describes a method for determining a physical characteristic of an adhesive material on a semiconductor device element using structured light. The method involves applying a structured light pattern to the adhesive material, creating an image of this pattern with a camera, and analyzing the image to ascertain the physical characteristics of the adhesive material. Additional methods and systems for determining physical characteristics of semiconductor devices and elements using structured light are also included in this patent.
Career Highlights
David A Rauth is currently employed at Kulicke and Soffa Industries, Inc., where he continues to develop innovative solutions in semiconductor technology. His expertise in structured light applications has positioned him as a valuable asset in his field.
Collaborations
David has collaborated with notable colleagues such as Deepak Sood and Zhijie Wang, contributing to advancements in semiconductor technology through teamwork and shared expertise.
Conclusion
David A Rauth's innovative work in semiconductor technology, particularly in measuring physical characteristics using structured light, showcases his dedication to advancing the field. His contributions are significant and continue to impact the industry positively.