Dunlap, IL, United States of America

David A Penning

This inventor holds 1 USPTO granted patent. Top assignee: University of Cincinnati. Active years: 2002.

IDiyas Innovation Intelligence. (2026). Inventor Profile: David A Penning. Retrieved from https://idiyas.com/inventor/david-a-penning

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 11(Granted Patents)


Company Filing History:


Years Active: 2002

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1 patent (USPTO):Explore Patents

Title: David A. Penning: Innovator in Elastomeric Seal Technology

Introduction

David A. Penning is a notable inventor based in Dunlap, IL (US). He has made significant contributions to the field of elastomeric seals, particularly through his innovative patent that enhances the durability and resistance of these materials.

Latest Patents

David holds a patent for a product featuring a thin film polymer coating and a method of making it. This invention focuses on elastomeric seals, including O-rings, which can have chemically resistant thin films applied via plasma polymerization. This technique enhances wear resistance and environmental resistance without altering the physical properties of the elastomer. The films may consist of a silane polymer applied through plasma deposition in a radio frequency/microwave dual power source reactor. He has 1 patent to his name.

Career Highlights

David A. Penning is affiliated with the University of Cincinnati, where he continues to advance research in elastomeric materials. His work has implications for various industries that rely on durable sealing solutions.

Collaborations

Some of his notable coworkers include R. Giles Dillingham and F. James Boerio, who have collaborated with him on various projects related to elastomeric technology.

Conclusion

David A. Penning's innovative work in the field of elastomeric seals demonstrates his commitment to enhancing material performance through advanced technology. His contributions are valuable to both academia and industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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