Chicago, IL, United States of America

David A Kopf

This inventor holds 1 USPTO granted patent. Top assignee: The United States of America as Represented by the United States. Active years: 1981.

IDiyas Innovation Intelligence. (2026). Inventor Profile: David A Kopf. Retrieved from https://idiyas.com/inventor/david-a-kopf-09u753vb

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 13(Granted Patents)


Company Filing History:


Years Active: 1981

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1 patent (USPTO):Explore Patents

Title: David A Kopf: Innovator in Charged Particle Beam Technology

Introduction

David A Kopf is a notable inventor based in Chicago, IL (US). He has made significant contributions to the field of charged particle beam devices. His innovative work focuses on addressing the challenges associated with spherical aberration.

Latest Patents

Kopf holds a patent for a "Sextupole system for the correction of spherical aberration." This invention provides a means for compensating for spherical aberration in charged particle beam devices. The system includes a sextupole positioned between two focusing lenses, enhancing the performance of these devices.

Career Highlights

Kopf's career is marked by his dedication to advancing technology in the field of particle beams. His work has implications for various applications, including microscopy and materials science. He is recognized for his technical expertise and innovative approach to problem-solving.

Collaborations

Kopf has collaborated with notable figures in his field, including Albert V Crewe. Their partnership has contributed to advancements in charged particle beam technology.

Conclusion

David A Kopf's contributions to the field of charged particle beam devices highlight his innovative spirit and technical prowess. His patent for the sextupole system exemplifies his commitment to solving complex challenges in technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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