Chatsworth, GA, United States of America

David A Brown, Jr

This inventor holds 1 USPTO granted patent. Top assignee: Apt Advanced Polymer Technology Corp.. Active years: 2018.

IDiyas Innovation Intelligence. (2026). Inventor Profile: David A Brown, Jr. Retrieved from https://idiyas.com/inventor/david-a-brown-jr

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2018

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1 patent (USPTO):Explore Patents

Title: Innovations by David A Brown, Jr.

Introduction

David A Brown, Jr. is an accomplished inventor based in Chatsworth, Georgia. He has made significant contributions to the field of synthetic turf recycling. His innovative approach addresses the environmental challenges associated with used synthetic turf.

Latest Patents

David holds a patent for a "Method and apparatus for purifying and recycling synthetic turf." This invention provides a systematic method for removing and recycling used synthetic turf. The process involves removing a section of the turf, using a rotating beater to dislodge sand infill, and employing a rotating brush roll to clean the turf filaments effectively.

Career Highlights

David is associated with Apt Advanced Polymer Technology Corp., where he applies his expertise in polymer technology to develop sustainable solutions. His work focuses on enhancing the lifecycle of synthetic materials, contributing to environmental sustainability.

Collaborations

David has collaborated with notable colleagues, including Larry E Mashburn and Timothy J Gentry, Sr. These partnerships have fostered innovation and the development of effective recycling methods.

Conclusion

David A Brown, Jr. exemplifies the spirit of innovation through his work in synthetic turf recycling. His contributions not only advance technology but also promote environmental sustainability.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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