Neuhofen, Germany

Darshan Patwardhan

This inventor holds 1 USPTO granted patent. Top assignee: Basf Se Corporation. Active years: 2010.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Darshan Patwardhan. Retrieved from https://idiyas.com/inventor/darshan-patwardhan

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 4(Granted Patents)


Company Filing History:


Years Active: 2010

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1 patent (USPTO):Explore Patents

Title: Darshan Patwardhan: Innovator in Ampholytic Copolymers

Introduction

Darshan Patwardhan is a notable inventor based in Neuhofen, Germany. He has made significant contributions to the field of polymer chemistry, particularly in the development of ampholytic copolymers. His work has implications in various industries, including cosmetics and pharmaceuticals.

Latest Patents

Darshan Patwardhan holds 1 patent for his invention titled "Ampholytic anionic copolymers." This patent describes ampholytic copolymers that contain a molar excess of anionogenic and/or anionic groups. It also covers polyelectrolyte complexes that incorporate such ampholytic copolymers, as well as cosmetic and pharmaceutical compositions that utilize these innovative materials.

Career Highlights

Darshan is currently employed at BASF SE Corporation, a leading global chemical company. His role involves research and development in polymer applications, where he applies his expertise to create advanced materials that meet industry needs.

Collaborations

Throughout his career, Darshan has collaborated with talented individuals such as Son Nguyen-Kim and Klemens Mathauer. These partnerships have fostered innovation and contributed to the successful development of new products and technologies.

Conclusion

Darshan Patwardhan's work in ampholytic copolymers exemplifies the impact of innovative thinking in the field of polymer chemistry. His contributions continue to influence the development of new materials in various applications.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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