Essex, United Kingdom

Darrin Bowler

This inventor holds 1 USPTO granted patent. Top assignee: Eev Limited. Active years: 2002.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Darrin Bowler. Retrieved from https://idiyas.com/inventor/darrin-bowler-2cfcdr6j

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 2002

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1 patent (USPTO):Explore Patents

Title: Darrin Bowler: Innovator in Electron Beam Technology

Introduction

Darrin Bowler is a notable inventor based in Essex, GB. He has made significant contributions to the field of electron beam technology, particularly through his innovative patent related to electron beam tubes. His work has implications for various applications in electronics and communications.

Latest Patents

Darrin Bowler holds a patent for an electron beam tube, which includes a penultimate resonant cavity located before the output cavity. This penultimate resonant cavity is designed to be inductively coupled and resonates at a frequency slightly greater than a harmonic frequency. This design enhances the sharpening of electron bunches arriving at the output cavity, resulting in increased efficiency.

Career Highlights

Darrin Bowler is associated with EEV Limited, a company known for its advancements in electronic engineering. His work at EEV Limited has allowed him to focus on developing cutting-edge technologies that push the boundaries of electron beam applications.

Collaborations

Darrin collaborates with David Mark Wilcox, a fellow innovator in the field. Their partnership has fostered a creative environment that encourages the development of new technologies and solutions.

Conclusion

Darrin Bowler's contributions to electron beam technology exemplify the spirit of innovation. His patent and work at EEV Limited highlight the importance of advancements in this field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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