Company Filing History:
Years Active: 2009-2010
Title: The Innovative Contributions of Darren V Goedeke
Introduction
Darren V Goedeke is a notable inventor based in Pflugerville, Texas. He has made significant contributions to the field of semiconductor technology, holding two patents that showcase his expertise and innovative spirit. His work focuses on methods that enhance the performance of semiconductor devices.
Latest Patents
Darren's latest patents include a method of making a semiconductor device with an embedded stressor. This method involves several steps, such as providing a semiconductor substrate, forming a gate dielectric, and implanting a dopant in the source and drain regions. The innovation allows for improved carrier mobility in the channel while maintaining short channel effects. Another patent he holds is for a multi-layer source/drain stressor, which details the formation of recesses in the source and drain regions and the use of stressor materials to enhance device performance.
Career Highlights
Darren V Goedeke is currently employed at Freescale Semiconductor, Inc., where he applies his knowledge and skills to advance semiconductor technologies. His work has contributed to the development of more efficient and effective semiconductor devices, which are crucial in various electronic applications.
Collaborations
Darren has collaborated with talented coworkers such as Veeraraghavan Dhandapani and Da Zhang. Their combined efforts in the field of semiconductor technology have led to innovative solutions and advancements.
Conclusion
Darren V Goedeke's contributions to semiconductor technology through his patents and work at Freescale Semiconductor, Inc. highlight his role as an influential inventor in the industry. His innovative methods continue to shape the future of semiconductor devices.