This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignee: USA as Represented by Secretary of the Navy. Active years: 2000.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2000
Title: The Innovative Contributions of Darrell King
Introduction
Darrell King is an accomplished inventor based in Woodbridge, VA (US). He has made significant contributions to the field of chemical mechanical polishing, particularly in the polishing of copper surfaces. His innovative approach has led to the development of a unique composition that enhances the efficiency and effectiveness of polishing processes.
Latest Patents
Darrell King holds a patent for a composition used in the chemical mechanical polishing of copper. This composition includes 0.5% by volume of an etchant such as nitric acid, ammonium hydroxide, hydrogen peroxide, acetic acid, or ammonium chloride. Additionally, it contains 0.1-1% by weight of an azole selected from benzotriazole and its derivatives, 0.1-2% by volume of a biodegradable detergent, and deionized water or a lower alkanol to complete the composition. The polishing method involves treating the bottom copper surface of a magnetic electronic device with this composition for 5-30 minutes to achieve an rms roughness of less than about 6 Å.
Career Highlights
Throughout his career, Darrell King has worked with notable organizations, including the United States Navy and K & G Enterprises, LLC. His experience in these companies has allowed him to apply his innovative ideas in practical settings, contributing to advancements in technology and manufacturing processes.
Collaborations
Darrell has collaborated with esteemed colleagues such as Shu-Fan Cheng and Puzant Khatchadourian. These partnerships have fostered a creative environment that has led to the development of effective solutions in the field of polishing technologies.
Conclusion
Darrell King's contributions to the field of chemical mechanical polishing demonstrate his innovative spirit and dedication to advancing technology. His patent for a unique polishing composition highlights his ability to solve complex problems in manufacturing. His work continues to influence the industry and inspire future innovations.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile