This inventor holds 1 USPTO granted patent. Top assignees: Brookhaven Science Associates, Lcc, The State University of New York. Active years: 2024.
Company Filing History:
1 out of 351 
1 out of 2,044 
Years Active: 2024
Title: Dario J Stacchiola: Innovator in Noble Gas Trapping Technology
Introduction
Dario J Stacchiola is a notable inventor based in South Setauket, NY (US). He has made significant contributions to the field of nanotechnology, particularly in the area of noble gas trapping. His innovative methods have the potential to advance various scientific applications.
Latest Patents
Dario J Stacchiola holds a patent for a method titled "Method for trapping noble gas atoms and molecules in oxide nanocages." This method involves providing oxide nanocages on a metallic substrate, ionizing a noble gas to form noble gas cations, applying a voltage to the metallic substrate, and contacting the oxide nanocages with the noble gas cations. The process culminates in deionizing the cations to form noble gas atoms and molecules that are trapped within the oxide nanocages. One embodiment of this device utilizes polygonal prism organosilicate cages on a ruthenium thin film to effectively trap noble gases.
Career Highlights
Throughout his career, Dario has worked with esteemed institutions such as the State University of New York and Brookhaven Science Associates, LLC. His work has been instrumental in advancing research in nanotechnology and materials science.
Collaborations
Dario has collaborated with notable colleagues, including Yixin Xu and Alejandro Miguel Boscoboinik. These partnerships have contributed to the development of innovative technologies and research in their respective fields.
Conclusion
Dario J Stacchiola's contributions to the field of noble gas trapping technology highlight his innovative spirit and dedication to scientific advancement. His work continues to inspire future research and development in nanotechnology.